ANALYSIS TYPE / 09
Aberration Correction · Tolerancing · Manufacturability
Overview
Lens design simulation covers sequential and non-sequential ray tracing for cameras, microscopes, telescopes, projectors, and laser systems — optimising aberration correction, transmission, and manufacturability within tight tolerances. Tolerance analysis quantifies the yield sensitivity to element tilt, decenter, and surface irregularity — identifying which elements require tightest control and enabling cost-effective balance between optical performance and manufacturing complexity.
Industries Served
Deliverables
Key Aspects
Evaluating all third-order and higher-order Seidel aberrations — spherical, coma, astigmatism, field curvature, distortion, and chromatic — and designing corrective element combinations.
Defining and optimising a merit function that balances wavefront error (RMS WFE), spot size, distortion, and chief ray angle across the full field and wavelength range.
Quantifying the sensitivity of optical performance to manufacturing tolerances — element tilt, decenter, thickness, surface irregularity — predicting yield and informing tight-tolerance elements.
Tracing parasitic reflections and ghost images through the lens system using non-sequential ray tracing — identifying critical surfaces for AR coating and baffling requirements.
Connect with our optics & photonics simulation team to discuss the right approach for your application.
